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Measurement of Surface Friction of MoS2 on h-BN and SiO2 Substrates
- Lee, Youngchel;
- Han, Byungchae;
- Yang, Dongin;
- Kim, Youkyoung;
- Kim, Hyunki;
- ... Lee, Minbaek;
- 외 1명
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The nanoscale friction of mechanically exfoliated molybdenum disulfide (MoS2) on hexagonal boron nitride (h-BN) and SiO2 substrates is quantitatively compared using lateral force microscopy under dry nitrogen conditions. Friction force on MoS2/h-BN consistently exhibits higher values with larger variation compared to MoS2/SiO2. This trend persists across a wide range of MoS2 thicknesses (c.a. 2–30 nm) and shows little correlation with surface roughness. Force–distance curve measurements further reveal stronger adhesion for MoS2 on h-BN. These findings imply that, in the nanoscale friction regime, the direct interaction between the tip and the 2D flake serves as the dominant factor, outweighing the effects of surface roughness, thickness, or loading force. Our results provide critical insights into the fundamental mechanisms of nanoscale friction in 2D heterostructures. © 2026 The Author(s). physica status solidi (RRL) Rapid Research Letters published by Wiley-VCH GmbH.
키워드
- 제목
- Measurement of Surface Friction of MoS2 on h-BN and SiO2 Substrates
- 저자
- Lee, Youngchel; Han, Byungchae; Yang, Dongin; Kim, Youkyoung; Kim, Hyunki; Woo, Minhyeong; Lee, Minbaek
- 발행일
- 2026-06
- 유형
- Article
- 권
- 20
- 호
- 6