UV-Visible Antireflection Coating of Nanoparticles on Various Polymer

초록

To achieve good antireflective(AR) behavior with various types of films, we deposited hollow mesoporous silica nanoparticles (HMSs) onto highly transparent polymer substrates such as poly(ethylene terephthalate, poly(methyl methacrylate), and polystyrene. HMSNs were initially synthesized using monodisperse polymer colloides, together with tetraethylorthosilcate (TEOS) as a precursor and cetylltrimethylammonium bromide(CTAB) as a structure-directing agent. HMSs were deposited onto substrates by spin coating or spray coating, and annealed at various times at room temperature to change the embedding depth of HMSs on the polymer substrate. The embedding depth of nanoparticles afffected UV-visible AR behavior on polymer substrates. The surface morphology of the embedded films was investigated by cross sectional SEM, TEM, and AFM.