플라즈마 반응로에서 반응체의 균일한 흐름을 위한 유동해석

초록

Computational flow dynamics (CFD) simulation is used to study complicated flow pattern in the semiconductor process equipment. In this work, neutral gas flow patterns above the wafer surface for uniform flow distribution are calculated by CFD simulation. Velocity vectors and flux of neutral O2 gas molecules above the wafer and overall flow patterns from gas inlet to chamber exhaust are studied in terms of distance between wafer and baffle.