Embedded-grid silver transparent electrodes fabricated by selective metal condensation

초록

We report a new materials system for the fabrication of embedded silver grid electrodes with micron-sized linewidth >10 times narrower than can be achieved using the conventional printing techniques of screen, inject and flexographic printing. Using micro-contact printed thin films of the highly fluorinated polymer poly(3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluorodecyl methacrylate) together with low temperature heating of the substrate during metal deposition by thermal evaporation, we have fabricated embedded silver transparent grid electrodes on flexible plastic substrates without the need for a metal etching step or a separate grid-embedding step. This simplified approach to grid electrode fabrication is made possible by the very low condensation coefficient of Ag on areas of the substrate covered with the printed organofluorine layer, removing the need for harmful chemical etchants and slow chemical intensive electrochemical deposition steps.

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