Optimum Selection of Subfield Patterns for Plasma Displays based on Genetic Algorithm

초록

This paper presents a systematic method based on the genetic algorithm for the selection of the optimum subfield patterns to reduce the dynamic false contours on the plasma display panels. In the proposed method, a standard test image mimicking the contents of natural images is defined. The optimal subfield patterns are determined by minimizing the quantified measure of the dynamic false contours on the standard test image. The structure of string and three types of genetic algorithm operators are designed for the subfield pattern selection. Experimental results indicate that the subfield pattern obtained based on the proposed method lessens the dynamic false contours.

제목
Optimum Selection of Subfield Patterns for Plasma Displays based on Genetic Algorithm
저자
CHUNWU KIM
학회명
6th International Display Workshops