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- 제목
- Optical Perfomance of Binary Mask with a Tantalum Telluride Absorber Layer for Extreme Ultraviolet Lithography
- 저자
- CHANG KWON HWANGBO
- 학회명
- The 56th International Conference on Electron, Ion and Photon Beam Technology & Nanofabrication
- 개최지
- Hilton Waikoloa Village Waikoloa, Hawaii
- 학회 개최일
- 2012-05-29 ~ 2012-06-01