Optical and structural properties of TiO2 and MgF2 thin films by plasma ion assisted deposition

초록

we deposited TiO2 and MgF2 thin films by a variety of deposition methods such as conventional evaporation (CE), CE with heating at 140˚C, plasma ion assisted deposition (PIAD) and PIAD with heating at 140˚C, The optical constants, surface roughness, crystalline structure and microstructure of them were studied by spectrophotometry, surface probe microscopy (SPM), scanning electron microscopy (SEM), optical stereoscopic microscopy, and X-ray diffractometry (XRD).