ScholarWorks@인하대학교
조직
연구자
연구성과
저널
English
상세 보기
Atomistic Simulation of Boron Diffusion in Strained Si/SiGe
WON TAEYOUNG
Citation
APA
CHICAGO
MLA
VANCOUVER
IEEE
HARVARD
Export
XML (DC)
EXCEL
제목
Atomistic Simulation of Boron Diffusion in Strained Si/SiGe
저자
WON TAEYOUNG
학회명
2006 International Confernece on Nano Scienece and Nano Technology
더보기