플라즈마 공정을 이용한 나노미터 단위의 진공리소그래피

초록

This work was carried out to develop a pattern on the nanometer scale using plasma polymerization and plasma etching. This study is also aimed at developing a resis for the nano process and a vacuum lithography process. The thin film of plasma polymerization were favricated by the plasma polymerization of inter-electrode capacitively coupled gasflow system. After delineating the pattern at accelerating voltage of 30[kV], ranging the dose of 1∼500[mC/Cm2], the pattern was developed with type and formed by plasma etching.