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Mechanism of Selective Etching with Fluorocarbon Gases(CF4, C4F8) and Hydrogen Mixture in Electron Cyclotron Resonance Plasma Etching System
- 제목
- Mechanism of Selective Etching with Fluorocarbon Gases(CF4, C4F8) and Hydrogen Mixture in Electron Cyclotron Resonance Plasma Etching System
- 저자
- LEE SEOK HYUN
- 학회명
- 42nd National Symposium and Topical Conferences of the American Vacuum Society