위상변위 마스크에 의한 단차효과 분석

초록

Though alternating phase shifting masks have been widely used for increasing the resolution and the depth of focus, the light scattering due to their intrinsic topological structures could give harmful influence on aerial images. In order to evaluate those mask topological effects, the rigorous vector model based on RCWA was implemented into our aerial image simulator AIS96. It was found from the simulation that the effects of mask topology could be appeared as asymmetry peaks. Those asymmetry was varied with both the polarization angle of an exposing light and mask shapes.