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초록
A circular ferroelectric tunnel junction (C-FTJ) is proposed for a larger memory window and better endurance than a conventional planar FTJ (P-FTJ). The electrical characteristics of the proposed C-FTJ are evaluated compared with a conventional P-FTJ by using device simulation. It is confirmed that C-FTJs have more excellent ferroelectric switching than P-FTJs because the electric field becomes more concentrated across the ferroelectric layer. Also, C-FTJs show better endurance because the electric field applied to the interfacial layer is alleviated. (c) 2023 The Japan Society of Applied Physics
키워드
ferroelectric tunnel junction; HfO2; MFIS; MFIM; endurance; ferroelectric switching; IL degradation; THIN-FILMS; TEMPERATURE; LAYER
- 제목
- Circular ferroelectric tunnel junctions for the improvement of memory window and endurance
- 저자
- Kim, Dong-Oh; Kim, Changha; Kim, Hyun-Min; Park, Jonghyuk; Jeon, Bosung; Kwon, Daewoong; Choi, Woo Young
- 발행일
- 2023-06-01
- 유형
- Article
- 권
- 62
- 호
- SG