Circular ferroelectric tunnel junctions for the improvement of memory window and endurance

  • Kim, Dong-Oh
  • Kim, Changha
  • Kim, Hyun-Min
  • Park, Jonghyuk
  • Jeon, Bosung
  • 외 2명
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초록

A circular ferroelectric tunnel junction (C-FTJ) is proposed for a larger memory window and better endurance than a conventional planar FTJ (P-FTJ). The electrical characteristics of the proposed C-FTJ are evaluated compared with a conventional P-FTJ by using device simulation. It is confirmed that C-FTJs have more excellent ferroelectric switching than P-FTJs because the electric field becomes more concentrated across the ferroelectric layer. Also, C-FTJs show better endurance because the electric field applied to the interfacial layer is alleviated. (c) 2023 The Japan Society of Applied Physics

키워드

ferroelectric tunnel junctionHfO2MFISMFIMenduranceferroelectric switchingIL degradationTHIN-FILMSTEMPERATURELAYER
제목
Circular ferroelectric tunnel junctions for the improvement of memory window and endurance
저자
Kim, Dong-OhKim, ChanghaKim, Hyun-MinPark, JonghyukJeon, BosungKwon, DaewoongChoi, Woo Young
DOI
10.35848/1347-4065/acc669
발행일
2023-06-01
유형
Article
저널명
Japanese Journal of Applied Physics
62
SG