자가 집합된 은 나노 입자의 촉매 작용을 이용한 습식 식각으로 형성된 실리콘 무반사막

Antireflection subwavelength structure of silicon surface formed by wet process using catalysis of self-aggregated gold nano particle
  • PARK SEGEUN

초록

A Subwavelength structure (SWS) was formed by simple wet chemical etching using catalysis of gold (Au) nanoparticle. Single nano-sized Au particle was fabricated by self-aggregation effect. Au was deposited 2, 4 and 6 nm by sputter, and annealed about 500 C on hotplate. Then, the samples were soaked in an aqueous etching solution of hydrofluoric acid and hydrogen peroxide. The surface of 15-min-etched Si substrate appeared black. The reflectivity of the Si substrate was reduced to below 5% throughout the entire spectrum from 300 to 800 nm owing to SWS.

제목
자가 집합된 은 나노 입자의 촉매 작용을 이용한 습식 식각으로 형성된 실리콘 무반사막
제목 (타언어)
Antireflection subwavelength structure of silicon surface formed by wet process using catalysis of self-aggregated gold nano particle
저자
PARK SEGEUN
학회명
2010 대한전자공학회 하계학술대회
개최지
제주 그랜드호텔
학회 개최일
2010-06-16 ~ 2010-06-18