Nano scale patterning technology using vacuum lithography

초록

The preparation of the resist for the vaccum lithograpy was carried out by plasma polymerization. the resist manufactured by plasma polymerization is a monomer produced by MMA(Methyl methacrylate). The funcitonal groups of MMA appeared in the PPMMA(Plasma Polymerized Methyl methacrylate) as well, and this was confirmed through an analysis using FT-IR. The polymerization rate increased as a function of the plasma power and decresed as a function of the system pressure. The sensitivity and contrast of the plasma polymerized thin films were 6uc/cm2 and 4.3 respectively. The size of the pattern manufactured by Vaccum Lithography using the plasma polymerized thin films was 100nm