Helical Resonator 배열을 통한 대면적 고밀도 Plasma Source

초록

An array of smaller unit plasma sources have been be used for generating larger area plasma to process large substrates such as flat panel display(FPD). In this work, four helical resonators are distributed in a 2 ×2 array by modifying upper part of the conventional reactive ion etching(RIE) type LCD etcher. Since the resonance condition of the RF signal to the helical antenna, one RF power supply is used for delivering the power efficiently to all four helical resonators without an impedance matching network. Previous work of 2 ×2array inductively coupled plasma(ICP)requires one matching circuit to each ICP antenna for more efficient power deliverly. Distributions of ion density and electron temperature are measured in terms of chamber pressure, gas flow rate and RF power. By adjusting the power distribution among the four helical resonator units, argon plasma density of higher than 1016/m3 with the uniformity of better than 7% can be obtained in the 620 ×620mm2 chamber.