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산화막 식각에 적용된 E-ICP효과와 형상단면 비교

Oxide etching characteristics and Etched Profiles by the Enhanced Inductive Coupled Plasma
  • PARK SEGEUN
제목
산화막 식각에 적용된 E-ICP효과와 형상단면 비교
제목 (타언어)
Oxide etching characteristics and Etched Profiles by the Enhanced Inductive Coupled Plasma
저자
PARK SEGEUN
학회명
한국전기전자재료학회 하계학술대회 논문집

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