Nanostructural and PL Features of nc-Si:H Thin Films Prepared by PECVD Techniques

초록

We report the investigation of the effects of hydrogen on the nanostructure of the nc-Si:H thin films prepared by PECVD. Within the deposition conditions in this experiment, it is observed that there is a trend in the variation of the nanostructure and optical characteristics of the films depending on the hydrogen content as well as post-deposition annealing. The relation of the nano-structural features of the films with the optical characteristics was discussed.