ScholarWorks@인하대학교

상세 보기

Damage Free Process of MISFET(TaN/HfO2/Si) by Inductively Coupled Plasma

  • PARK SEGEUN
제목
Damage Free Process of MISFET(TaN/HfO2/Si) by Inductively Coupled Plasma
저자
PARK SEGEUN
학회명
2005 Dry Process International Symposium

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.