ScholarWorks@인하대학교

상세 보기

Effect of Substrate Bias and Temperature on the Structural and Physical Characteristics of nc-Si:H Films Prepared by PECVD

  • CHO NAMHEE
제목
Effect of Substrate Bias and Temperature on the Structural and Physical Characteristics of nc-Si:H Films Prepared by PECVD
저자
CHO NAMHEE
학회명
19th International Photovoltaic Science and Engineering Conference and Exhibition
개최지
ICC, Jeju
학회 개최일
2009-11-09 ~ 2009-11-13

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.