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초록
Low-e filters with the repetition of [dielectric|protective|Ag|dielectric] structures have been fabricated for display applications by using RF magnetron sputtering. TiO2 is used as a dielectric layer while Ti, TiOx and ITO (Indium tin oxide) layers are used as protective layers to prohibit the oxidation and disruption of Ag in the reactive sputtering process of TiO2
- 제목
- Characterization of the optical and structural properties of the low-e filters with Ti, TiOx, and ITO protective layers
- 제목 (타언어)
- Characterization of the optical and structural properties of the low-e filters with Ti, TiOx, and ITO protective layers
- 저자
- CHANG KWON HWANGBO
- 학회명
- The 4th Asian-European International Conference on Plasma Surface Engineering(AEPSE 2003)