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Dependence of Etch Selectivity of SiO2 Etching on the Axial Magnetic Field Added to ICP
Dependence of Etch Selectivity of SiO2 Etching on the Axial Magnetic Field Added to ICP
- 제목
- Dependence of Etch Selectivity of SiO2 Etching on the Axial Magnetic Field Added to ICP
- 제목 (타언어)
- Dependence of Etch Selectivity of SiO2 Etching on the Axial Magnetic Field Added to ICP
- 저자
- O BEOM HOAN
- 학회명
- ISPSA-2004, pp. 108, (2004. 03)