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초록
Synthetic diamond films were deposited on pretreated silicon substrate in activated gas phase using RF plasma-assisted CVD. We investigated the influence of O2 gas on facets of diamond crystal. In H2-CH4-O2 gas mixture, the increase of oxygen concentration lead to well-faceted diamond particles and increasing crystallinity of diamond films. The deposited diamond films were analyzed by SEM, XRD, Raman spectroscopy.
- 제목
- 고주파 플라즈마 CVD 다이아몬드 박막의 합성시 첨가된 산소의 효과
- 제목 (타언어)
- The effect of oxygen in RF PACVD diamond thin film
- 저자
- Lee Duck Chool
- 학회명
- 대한전기학회지