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Optical Design of hybrid-type attenuated phase shift mask with ITO absorber for Extrime Ultraviolet lithography

  • CHANG KWON HWANGBO
제목
Optical Design of hybrid-type attenuated phase shift mask with ITO absorber for Extrime Ultraviolet lithography
저자
CHANG KWON HWANGBO
학회명
APCTP-ASEAN Workshop on Advanced Materials Science and Nanotechnology
개최지
Nha Trang
학회 개최일
2008-09-15 ~ 2008-09-21

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