Tribological characteristics of atomic-scale niobium diselenide grown via chemical vapor deposition

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초록

The nanoscale tribological characteristics of atomic-layered niobium diselenide (NbSe2) were investigated using atomic force microscopy (AFM). Two-dimensional NbSe(2)atomic layers were produced on a weakly-adherent silicon wafer using two different methods: (1) mechanical exfoliation and (2) controlled synthesis via chemical vapor deposition. Using an AFM cantilever tip, a normal force was applied on the NbSe(2)atomic-scale thin films in order to measure friction force. The as-synthesized NbSe(2)thin films exhibited atomic lattice stick-slip friction, with the thinnest sheets showing a sliding length-dependent increase in static friction. This tendency is attributed to the increased susceptibility of the thinner chemically-synthesized NbSe(2)sheets toward out-of-plane elastic deformation.

키워드

niobium diselenide; chemical vapor deposition; AFM; stick-slip; LATERAL FORCE MICROSCOPY; FRICTION COEFFICIENT; MOS2 TRANSISTORS; METAL; TRANSPORT; SCHOTTKY; CONTACTS; HETEROSTRUCTURES; RESISTANCE; OXIDATION
제목
Tribological characteristics of atomic-scale niobium diselenide grown via chemical vapor deposition
저자
Shin, Won-Sang; Park, ChangKyoo; Seo, Juyeon; Jung, Dong-Hyuck; Choi, Eun; Lee, Moonsang; Kim, Un Jeong; Hahm, Myung Gwan; Kim, Yoon-Jun
DOI
10.35848/1882-0786/abb91b
발행일
2020-10-01
유형
Article
저널명
Applied Physics Express
권
13
호
10