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- 제목
- Infinitely high selective etching of Sn02 binary mask structure for extreme ultraviolet lithography
- 저자
- CHANG KWON HWANGBO
- 학회명
- International Conference on Electronic Materials 2010 presented by International Union of Materials Research Societies
- 개최지
- Kintex, Goyang
- 학회 개최일
- 2010-08-22 ~ 2010-08-27