Optical and structural characterization of metal-dielectric NIR cutoff filters with Ti and ITO barrier layers for PDP application

초록

Electromagnetic interference shielding and near infrared (NIR) cutoff filters for plasma display panels (PDP) were designed and fabricated with (ITO/Ag/ITO), (TiO2/Ti/Ag/TiO2), and (TiO2/ITO/Ag/ITO/ TiO2) structures on glass substrates by RF-magnetron sputtering. Ti and ITO layers on the Ag conductive layers have been used as barrier materials to prevent the oxidations and the diffusions of silver into the vicinity layers. ITO adopted NIR cutoff filters may provide high transmittance in the visible and high cutoff in NIR due to the low absorption in the visible and the high conductivity.