Determination of Evolution Path for BmIn Clusters in Atomistic Model

  • WON TAEYOUNG

초록

clusters during boron diffusion using a simple atomistic model for describing the kinetic Monte Carlo (KMC). It has been known that clusters generated after ion implantation play a decisive role in the enhanced boron diffusion at the tail region in contrast to the immobile property at the peak region. Our model, which is based on the simple continuum model [2], takes the intermediate clusters into account as well as dominant clusters for understanding the evolutionary behaviour of boron interstitial clusters during boron diffusion. We found out that the intermediate clusters such as B3I3 and B2I3 play a significant role despite that the lifetime of the corresponding intermediate clusters are relatively short due to low binding energies. Additionally, our investigation revealed that the density of BI2 clusters increased at the beginning of the annealing process while the density of B3I increased at a later stage. Also, we found the evolution path of dominant clusters from B2I to B3I during annealing. Finally, KMC simulation results were compared with experimental data, which demonstrated an excellent agreement

제목
Determination of Evolution Path for BmIn Clusters in Atomistic Model
저자
WON TAEYOUNG
학회명
International Semiconductor Device Research Symposium(ISDRS 2005)