Fluoropolymer를 이용한 Ag Nanowire 패턴 형성 방법

초록

In this paper, using a patterned poly(dimethylsiloxane) (PDMS) mold, poly(1H,1H,2H,2H-perfluorodecyl methacrylate) polymer (PFDMA) films is selectively deposited on a glass substrate. Ag nanowire dispersed in isopropyl alcohol can be coated on a glass substrate without damaging the patterned PFDMA films because there is no reaction between PFDMA and isopropyl alcohol. After coating, the substrate was dipped into a hydrofluoroethers solvent with sonication and 25um line and space patterns of Ag nanowire can be fabricated by a lift-off process.