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Sidewall Passivation Effect during C4F8 + N2 Etch Process for SiOCH Low-k Films.

  • LEE EL HANG
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Sidewall Passivation Effect during C4F8 + N2 Etch Process for SiOCH Low-k Films.
저자
LEE EL HANG
학회명
AVS 54th International Symposium & Exhibition

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