Electrical Insulation Properties of the Polyimide Prepared by VDPM

초록

The polyimide thin films, which are synthesized with pytomellictic dianhydride(PMDA) and 4,4'-diaminodiphenyl ether(DDE), were fabricated by vapor deposition polymerized method of dry processes. In order to analyze the characteristics required for the inter-layer insulation films of semiconductor devices, the molecular structure and uniformity, the variation of the internal composition element, the permeation depth of upper electrode, the breakdown strength are experimentally investigated.