플라즈마 공정을 이용한 완전한 건식리소그래피

초록

This work was carried out to devel pattern on the nanometer scale using polymerization and plasma etching. This study aimed at developing a resist for the nano process a vacuum lithography process. The thin film plasma polymerization were fabricated by the polymerization of inter-electrode capacitively gas flow system. After delineating the pattern accelerating voltage of 30[kV] ranging the do 1-500[μC/cm2] the pattern was developed type and formed by plasma etching.