유도결합 RF PACVD에 의한 다이아몬드 박막의 합성

초록

Diamond thin film was deposited on Si wafer from H2-CH4 gas by RF PACVD. Prior to deposition, mechanical scratching was done to improve density of nucleation sites with diamond paste of 3㎛. The microstructure of deposited diamond film was studied at various methane concentrations. The deposited diamond films showed that the crystallite was increased at the lower methane concentrations.