Vacuum lithography using plasma polymerization and plasma development

초록

The resist films of MST(Methyl methacrylate+Styrene+Tetramethytin) have been fabricated by the plasma polymerization of capacitively coupled gas flow system. It was found that this monomer produces uniform films with a wide range of thickness, from hundreds of nanometers to tens of micrometers. The depositon rate appeared to be dependent on the power and the pressure. The electron beam delineations were carried out using a precision electron beam delineation apparatus. The delineatied pattern of resist film was developed with a plasma development in the same chamber. We delineated a 0.5㎛ lines at a dose of 5μC/㎠. The recorded values of sensitivity and γ value of PPMST by vacuum lithography were 5μC/㎠ and 4.5, respectively.