ScholarWorks@인하대학교

상세 보기

Numerical Study on Deformation during Modeling Process under Thermal Nano Imprint Lithography

  • WON TAEYOUNG
제목
Numerical Study on Deformation during Modeling Process under Thermal Nano Imprint Lithography
저자
WON TAEYOUNG
학회명
The 14th International Symposium on the Physics of Semiconductors and Applications-2008
학회 개최일
2008-08-26 ~ 2008-08-29

ScholarWorks@인하대학교

22212 인천광역시 미추홀구 인하로 100 정석학술정보관 Tel. 032-860-9003

COPYRIGHT © 인하대학교 All Rights Reserved.

Certain data included herein are derived from the © Web of Science of Clarivate Analytics. All rights reserved.

You may not copy or re-distribute this material in whole or in part without the prior written consent of Clarivate Analytics.