comparison of the organic contaminants removal efficencies of various cleaing techniques using ATR-FTIR

초록

Attenuated Total Reflection Fourier Transform Infrared Spectroscopy(ATR-FTIR) was employed to monitor the organic impurities on silicon substrate surface intentionally contaminated and then cleaned by various cleaning techniques including O2 Electron Cyclotron Resonance (ECR) plasma cleaning. Ar ECR plasma cleaning, O2 plasma cleaning, UV/O3 cleaning and piranha cleaning. The cleaning efficiencies of these techniques were compared. The nature of the adsorption state of the organic contaminants were discussed based on the intensity and band shape of the bands of the Si-H and C-H stretching vibrations. The removal mechanism of the contaminants by O2 ECR plasma cleaning was also discussed