Crystallinity, Microstructure, and Photoluminescence of the Si films Prepared by Rf Magnetron Sputter and PECVD Techniques

초록

In this study, we investigated the crystallinity and microstructure of the Si films as a function of deposition parameters and post-deposition heat-treatment conditions, prepared by rf magnetron sputter and PECVD techniques, and discussed the relations of the PL spectra of the Si films with process variables.