Improvement of etch homogeneity in large area by the hybrid application of the perioidic weak axial magnetic field to a 2×2 array ICP source

초록

The international conference on metallurgical coatings and thin films (ICMCTF 2001), April 30 ∼ May 4. 2001. Town and country hotel, san diego, california. USA Recently, the size of flat panel display(FPD) is increased and the size of the pattern feature size is shrunk. The dry etching technique for FPD glass needs to be improved especially for the large area uniformity. Various efforts, such as a deformed 1-turn antenna, section antennas, and so forth, has been tried to improve the etch uniformity. Here, we report the result of hybrid application of the periodic axial magnetic field to a 2 2 array ICP source. The periodic axial magnetic field, named as the Enhanced-ICP, is known to improve not only the etch rate but also the homogeneity, which is not obtained by the constant axial magnetic field. Processes of photo-resist etch on the 350 300mm glass with oxygen plasma by normal CW-ICP, M-ICP and E-ICP provides the evidence of improvement of etch rate and homogeneity in large area by E-ICP operation. This hybrid operation is expected to improve processes of other materials also.