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Control of duty ratio in waveguide gratings using a Near-Field Holographic lithography system with a variable aperture
Control of duty ratio in waveguide gratings using a Near-Field Holographic lithography system with a variable aperture
- 제목
- Control of duty ratio in waveguide gratings using a Near-Field Holographic lithography system with a variable aperture
- 제목 (타언어)
- Control of duty ratio in waveguide gratings using a Near-Field Holographic lithography system with a variable aperture
- 저자
- O BEOM HOAN
- 학회명
- 33rd International Conference on Micro-and nano-Engineering 2007