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Simulation Study on Stress Distribution during Nanoimprint Lithography Process

  • WON TAEYOUNG
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Simulation Study on Stress Distribution during Nanoimprint Lithography Process
저자
WON TAEYOUNG
학회명
2008 International Microprocesses and Nanotechnology Conference
개최지
Fukuoka
학회 개최일
2008-10-27 ~ 2008-10-30

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