Plasma Properties of YBaCAO Oxide Film by rf Facing Targets Magnetron Sputtering

초록

The optical emission of the rf facing targets mafnetron sputtering(rf FTMS) plasma was analysed to elucidate the sputtering process and the gas phase reaction. It is shown that oxygen content affects the amount of sputtered species. The resulting optimum conditions were found to be the rf power of 50 W, the substrate position of 20 mm, the total gas pressure of 60 mTorr, the oxygen mixture ratio of 40 % and the substrate temperature of 650 ℃.