진공증착법으로 제조된 P(VDF/TrFE)박막의 유전특성

Dielectric properties of P(VDF/TrFE) thin films prepared by physical vapor deposition method
  • Lee Duck Chool

초록

P(VDF/TrFE) copolymer thin films of 70/30 and 80/20 mol% rates were prepared by using a physical vapor deposition method. While thin films were prepared, substrate temperatures were maintained at 30℃ and 120℃, and heating source temperature was fixed at 350℃. Contrary to PVDF homopolymer, P(VDF/TrFE) copolymers were observed the Curie point(Tc) below the melting point. The copolymers were changed the Curie point(Tc)) and the melting point(Tm) as a function of substrate temperature and VDF mol%. The melting point of P(VDF/TrFE) thin films increased with increasing substrate temperature, however, Curie point decreased. Also with increasing VDF mol%, the melting and Curie points increased.

제목
진공증착법으로 제조된 P(VDF/TrFE)박막의 유전특성
제목 (타언어)
Dielectric properties of P(VDF/TrFE) thin films prepared by physical vapor deposition method
저자
Lee Duck Chool
학회명
대한전기학회 춘계학술대회