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Optical design of hybrid-type attenuated phase shift mask with ITO absorber for extreme ultraviolet lithography

Optical design of hybrid-type attenuated phase shift mask with ITO absorber for extreme ultraviolet lithography
  • CHANG KWON HWANGBO
제목
Optical design of hybrid-type attenuated phase shift mask with ITO absorber for extreme ultraviolet lithography
제목 (타언어)
Optical design of hybrid-type attenuated phase shift mask with ITO absorber for extreme ultraviolet lithography
저자
CHANG KWON HWANGBO
학회명
The 5th International Conference on Advanced Materials and Devices

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