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Chemical and Mechanical Features of nc-Si:H Thin Films Prepared by PECVD under Various Electrical Substrate-biases

  • CHO NAMHEE
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Chemical and Mechanical Features of nc-Si:H Thin Films Prepared by PECVD under Various Electrical Substrate-biases
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CHO NAMHEE
학회명
ISPlasma2012 4th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials

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