Numerical analysis on synthesis of aluminium nitride in thermal plasma processing

  • DONG WHA PARK

초록

Metal nitrides are useful material with many applications in the related industries. Among the metal nitrides, aluminium nitride (AlN) has been widely used for the plate and the film materials in the semiconductor. It have a positive properties that the high thermal conductivity (typically 200W/m∙K), the low thermal expansion coefficient, the electric insulation and the chemical stability

제목
Numerical analysis on synthesis of aluminium nitride in thermal plasma processing
저자
DONG WHA PARK
학회명
12th European Plasma Conference
개최지
Conference Center San Giovanni in Monte Aula Giorgio Prodi
학회 개최일
2012-06-24 ~ 2012-06-29