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TEMPERATURE-DEPENDENT EXFOLIATION BEHAVIOR OF MoS2 VIA QUENCHING
- Sung, Jae Min;
- Ali, Ammad;
- Park, Kee-Ryung;
- Lee, Mi Hye;
- Jeong, Da-Woon;
- ... Hwang, Haejin;
- 외 2명
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0초록
This study presents a novel method to exfoliate molybdenum disulfide (MoS2) using quenching. MoS2 is considered a promising material for energy storage and catalysis due to its excellent electronic and catalytic properties. Exfoliation maximizes surface area and enhances performance. Quenching involves rapid cooling from high temperatures, inducing thermal stress that effectively separates the layers of MoS2. In this study, bulk MoS2 was heat treated at various temperatures and then quenched to promote exfoliation. X-ray diffraction analysis confirmed the optimal exfoliation temperature at 150 degrees C, while Atomic Force Microscope measurements revealed exfoliated MoS2 layers with a thickness of 4-6 nm. This method offers a cost-effective approach with potential for large-scale production of high-quality MoS2 layers.
키워드
- 제목
- TEMPERATURE-DEPENDENT EXFOLIATION BEHAVIOR OF MoS2 VIA QUENCHING
- 저자
- Sung, Jae Min; Ali, Ammad; Park, Kee-Ryung; Lee, Mi Hye; Jeong, Da-Woon; Kim, Bum Sung; Hwang, Haejin; Song, Yoseb
- 발행일
- 2025
- 유형
- Article
- 권
- 70
- 호
- 3
- 페이지
- 1101 ~ 1105