MWPCVD에 의해 합성된 다이아몬드 박막 특성에 대한 증착조건의 영향

초록

The methastable state diamond films have been deposited on Si substrates using MWPCVD. Effect of each experimental paramaters of MWPCVD including CH4 conentrations, Oxygen additions, Operating pressure, etc, on the growth rate and crystallinity were invesitigated. The best crystallinity of the film at 3% methane concentration addition of oxygen to the CH4-H2O mixture gave improved film crystallinity at 50% oxygen concentration. Upon increasing the operating pressure the growth rate and crystallinity were increased simultaneously.