Investigation of the nano-structure and optical features of nc-Si films grown by rf magnetron sputter techniques

초록

RF magnetron sputter techniques were used to prepare the nc-Si thin films. We investigated the nano-structural characteristics of the films as a function of deposition parameters and post-deposition heat-treatment conditions; the films were grown on Si substrates at R.T. at various sputter power, and some of them were annealed at 800oC in vacuum.