Microwave Plasma CVD에 의한 Diamond 박막의합성에 관한 연구

초록

The methastable state diamond films have been deposited on Si substrates using MWPCVD. Effects of each experimental parameters of MWPCVD including CH4 concentrations, Oxygen additions, Operating pressure, deposition time, etc. on the growth rate and crystallinity were investigated. The best cryallinity of the film at 3% metane concentration addition of oxygen to the CH4-H2O mixture gave an improved film crystallinity at 50% oxygen concentration. Upon increasing the operating pressure and time, the growth rate and crystallinity were increased simultaneously.