Synthesis Method for High-Purity Silica Utilizing Silicon Sludge Waste and Its Applications in Semiconductor Packaging

초록

Silicon sludge generated from the semiconductor manufacturing process is used to synthesize silica nanoparticles using the atmospheric heating method. Specifically, metallic and organic impurities are removed through acid washing, followed by atmospheric heating to obtain high-purity silicon-containing silica nanoparticles. For comparison, silica nanoparticles are also synthesized using conventional hydrothermal and sol-gel methods. The chemical composition and morphology of the as-synthesized silica nanoparticles are examined, confirming that homogeneous particle sizes and high purity are achieved through the atmospheric heating method. Additionally, mass production of high-purity silica nanoparticles is successfully achieved. Thus, this study presents a cost-effective and environmentally friendly method to reduce the amount of silicon sludge generated from semiconductor packaging by recycling it into silica nanoparticles. Keywords: Semiconductor, Recycling, Silicon sludge waste, Packaging materials, High-purity silica †Corresponding Author: cmyoon4321@inha.ac.kr

제목
Synthesis Method for High-Purity Silica Utilizing Silicon Sludge Waste and Its Applications in Semiconductor Packaging
저자
Yoon Chang Min
학회명
2025년 춘계 한국마이크로전자 및 패키징학회