열성장을 통해 형성된 산화구리의 광전기화학적 특성

Photoelectrochemical property of thermal copper oxide thin films

초록

In the present work, copper oxide thin films were formed by heat-treatment method with different temperatures and atmosphere, e.g., at 200 ~ 400 ℃; in air and Ar atmosphere. The morphological, electrical and optical properties of the thermally fabricated Cu oxide films were analyzed by SEM, XRD, and UV-VIS spectrometer. Thereafter, photoelectrochemical properties of the thermal copper oxide films were analyzed under solar light (AM 1.5, 100 mW/cm2). Conclusively, the highest photocurrent was obtained with Cu2O formed under the optimum annealing condition at 300 ℃ in air atmosphere. In addition, EIS results of Cu oxide formed in air atmosphere showed relatively low resistance and long electron life-time compared with Cu Oxide fabricated in Ar atmosphere at the same temperature. This is because heat-treatment in Ar atmosphere could not form Cu2O due to lack of oxygen, and thermally formed CuO at high temperature suppressed stability and conductivity of the Cu oxide.

키워드

PhotoelectrochemistryHeat-treatmentCopper oxideWater splittingThermal oxide
제목
열성장을 통해 형성된 산화구리의 광전기화학적 특성
제목 (타언어)
Photoelectrochemical property of thermal copper oxide thin films
저자
최용선유정은이기영
DOI
10.5695/JSSE.2022.55.4.215
발행일
2022-08
유형
Y
저널명
한국표면공학회지
55
4
페이지
215 ~ 221